CLO Virtual Fashion has released Marvelous Designer 9 which brings retopology and symmetry tools, new subdivision features, and more.

The update also brings half pattern symmetry, mirror creation, and GPU acceleration for improved performance during simulations. There's a number of improvements that will smooth your workflow and save time. 

New features:

• GPU Simulation
• Retopology
• Half Pattern Symmetry
• Subdivision
• Mirror Creation
• Environment Display 3D (Improved)
• Pattern Making Tools (Improved)
• Texure Bake (Improved)
• Create Buttonholes along Pattern Outline (Improved)

You can learn more by following this link.